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MEG-SE8
Spin Single Cleaner MEG-SE8
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| Description | Specification |
|---|---|
| Wafer Size | Φ4~8” (Si, GaAs, SIC, LNLT, Sapphire) |
| Transfer Robot | Multi Transfer Unit |
| Process Method | Al metal etchant, SC1, Ultra Sonic Cleaning E-Flow System (CO2), Jet Nano Spray, (MC Spray) |
| Other | Followed Semi Standard |
| OS | MS Windows10 Based, Ether-CAT |
| FA | SECSII, GEM Automation |
