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MEG-SS8A
Wafer Spin Scrubber MEG-SS8A
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| Description | Specification |
|---|---|
| Wafer Size | Φ4~8” (100mm~200mm) |
| Transfer Robot | Multi Transfer Unit IDR 2Arms, MTR 2Arms |
| Process Method | PVA Brush Cleaning, Ultra Sonic Cleaning, Jet Nano Spray (MC Spray) E-Flow System (CO2) |
| Other | Followed Semi Standard |
| OS | MS Windows10 Based, Ether-CAT |
| FA | SECSII, GEM Automation |
| Max speed | 250WPH |
| Process Throughput | Front 4chamber Process Time 56/sec 220WPH Both (2Front, 2Back) Process Time 56/sec 100WPH |
